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Batch Type Wet Station Bench

Model: WS-150/200/300 ; WSE-200/300

Category: Semiconductor Package Equipment

Exhibitor: SCIENTECH CORPORATION

Booth No: N303

Characteristic

Batch process suitable for mass production facotry.
Appicable for multiple process requirements..which as Etch/Clean/Organic removal/Particle removal/Metal ion removal/Eletroless-Plating
Comply for round/rectangular/square wafer or panel use. Size range from 5"~12"
Support high flexibility tool or customize comfiguration with modulized design.
Comply for SEMI-S2 guidline

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