Rapid Thermal Processing Furnace (RTP)

 

Model: NBD-HR1200

Category: Semiconductor Package Equipment

Exhibitor: CHAO-DEE SCIENCE CO., LTD.

Booth No: N406

 

Characteristic

 

Rapid annealing furnace is referred to as RTP (Rapid Thermal Processing Furnace).
Not only does it have a very fast heating rate, but also after the sintering process is completed,
the sample is directly moved to room temperature to achieve rapid cooling in the physical state.
The equipment adopts a gas path structure with an inner tube for air inlet and an outer tube for air outlet,
so that the reaction atmosphere and the processed sample are fully and evenly contacted.
The annealing furnace is a commonly used equipment for growing large-size two-dimensional grapheme
by CVD method. The temperature measuring element is in direct contact with the sample to ensure the accuracy of the sample temperature.
1. Double-layer steel structure;
2. High-purity Al2O3 fiber refractory insulation material, which saves maximum energy;
3. The high-purity alumina coating on the refractory ceramic can extend the service life;
4. Alumina tube plugs can help you establish a customized temperature gradient within the tube.
◎Brand: NOBODY
◎CE certification

 

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