SCIL Nanoimprint Solutions High Precision Nanoimprint Solutions

Model: FabSCIL

Category: Compound Semiconductor Equipment

Booth No: N705

Characteristic

1) Exclusive Capillary effect imprinting methodology and special Nano-Glass resist materials. No additional pressure is applied for imprinting, patterns structures more easily remain intact. Low pressure imprint also leads to much longer stamp lifetimes, up to 700 imprints with a single stamp can be achieved. Significantly reduce production costs.
2) Exclusive Nano-Glass resist(inorganic sol-gel based), curing happens within 1~2 minutes with room temperature and ambient pressure, no UV is needed. Resist selectivity is high, inorganic traditional hard mask(SiO2, Si3N4, etc) can be skipped. Makes whole process faster, easier, and more cost effective.
3) Overlay alignment accuracy is much higher(as low as 300nm), since no rolling imprinting is required