PSI 3000 Polarized Stress Imaging System

Model: PSI 3000

Category: Semiconductor Package Equipment

Booth No: N220

Characteristic

The PSI product line from Semilab is engineered for deployment in high‑throughput, fully automated semiconductor fabs. These systems specialize in the detection, quantification, and visualization of crystal defects arising from mechanical stress within various substrate materials, including silicon wafers, silicon slugs, and glass components.
Leveraging polarized optical techniques, the PSI systems enable highly sensitive stress‑induced defect analysis by mapping birefringence patterns and stress‑related optical variations across the full wafer surface. This capability allows users to identify slip lines, dislocations, grain boundary disturbances, stress gradients, and other mechanically induced crystallographic anomalies with high spatial resolution.
Designed for 200 mm and 300 mm wafer manufacturing environments, the PSI platform supports fast automated wafer handling, stable measurement repeatability, and advanced image‑processing algorithms optimized for inline process control. These features make the PSI product line a critical tool for monitoring mechanical integrity during wafer manufacturing, post‑processing, and device integration steps.